TY - JOUR
T1 - Growth of polypyrrole-like films on self-assembly nanostructured silicon surfaces by PECVD
AU - Yagüe, Jose Luis
AU - Agulló, Núria
AU - Borrós, Salvador
PY - 2009/6
Y1 - 2009/6
N2 - The development of conducting polymers has become the aim of many research groups. This paper describes attempts to carry out a plasma polymerization of polypyrrole (PPy) on a nanostructured surface by attaching a 11-(pyrrol-1-yl-undecyl)dimethylchlorosilane molecule onto a silicon wafer surface in order to form a self-assembled monolayer (SAM). The effect of theSAMin the polymerization process is also studied. Important differences in the polymer deposition are found whether or not the surface has been modified with a SAM. Atomic force microscopy (AFM) and time-of-flight secondary ion mass spectrometry (TOFSIMS) analyses are performed to study the morphology, deposition, and growth of polypyrrole.
AB - The development of conducting polymers has become the aim of many research groups. This paper describes attempts to carry out a plasma polymerization of polypyrrole (PPy) on a nanostructured surface by attaching a 11-(pyrrol-1-yl-undecyl)dimethylchlorosilane molecule onto a silicon wafer surface in order to form a self-assembled monolayer (SAM). The effect of theSAMin the polymerization process is also studied. Important differences in the polymer deposition are found whether or not the surface has been modified with a SAM. Atomic force microscopy (AFM) and time-of-flight secondary ion mass spectrometry (TOFSIMS) analyses are performed to study the morphology, deposition, and growth of polypyrrole.
KW - Nucleation processes
KW - Plasma polymerization
KW - Polypyrrole
KW - Self-assembled monolayers
KW - Silane
UR - http://www.scopus.com/inward/record.url?scp=67650299986&partnerID=8YFLogxK
UR - https://www.webofscience.com/api/gateway?GWVersion=2&SrcApp=pure_univeritat_ramon_llull&SrcAuth=WosAPI&KeyUT=WOS:000267727400009&DestLinkType=FullRecord&DestApp=WOS_CPL
U2 - 10.1002/cvde.200806746
DO - 10.1002/cvde.200806746
M3 - Article
AN - SCOPUS:67650299986
SN - 0948-1907
VL - 15
SP - 128
EP - 132
JO - Chemical Vapor Deposition
JF - Chemical Vapor Deposition
IS - 4-6
ER -