TiN/SiNx submicronic multilayer coatings obtained by chemical vapor deposition in a fluidized bed reactor at atmospheric pressure (AP/FBR-CVD)

J. Perez-Mariano; J. Caro; C. Colominas

doi:10.1016/j.surfcoat.2006.08.032

TiN/SiN_x submicronic multilayer coatings obtained by chemical vapor deposition in a fluidized bed reactor at atmospheric pressure (AP/FBR-CVD)

J. Perez-Mariano
, J. Caro
, C. Colominas^*

^*Corresponding author for this work

Research output: Indexed journal article › Article › peer-review

16 Citations (Scopus)

Abstract

TiN/SiN_x multilayer coatings were deposited on stainless steel by Chemical Vapor Deposition in a Fluidized Bed Reactor at Atmospheric Pressure (AP/FBR-CVD) by reaction of TiCl₄ and SiCl₄ with NH₃ at 850 °C. Due to the immiscibility of crystalline TiN and amorphous SiN_x, interdiffusion between layers is avoided even at the high working temperature. The thickness of the individual layer was in the nanometer range. Coatings were characterized by means of SEM, TEM, GD-OES, SIMS, XRD and nanoindentation. A mechanism for the growth rate and diffusion of Ti and Si into the steel is discussed.

Original language	English
Pages (from-to)	4021-4025
Number of pages	5
Journal	Surface and Coatings Technology
Volume	201
Issue number	7 SPEC. ISS.
DOIs	https://doi.org/10.1016/j.surfcoat.2006.08.032
Publication status	Published - 20 Dec 2006
Event	International Conference on Metallurgical Coatings and Thin Films, ICMCTF 2006 - San Diego, CA, United States Duration: 1 Jan 2006 → 5 May 2006

Keywords

Chemical vapor deposition
FBR-CVD
Fluidized bed
Multilayer coating

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10.1016/j.surfcoat.2006.08.032

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title = "TiN/SiNx submicronic multilayer coatings obtained by chemical vapor deposition in a fluidized bed reactor at atmospheric pressure (AP/FBR-CVD)",

abstract = "TiN/SiNx multilayer coatings were deposited on stainless steel by Chemical Vapor Deposition in a Fluidized Bed Reactor at Atmospheric Pressure (AP/FBR-CVD) by reaction of TiCl4 and SiCl4 with NH3 at 850 °C. Due to the immiscibility of crystalline TiN and amorphous SiNx, interdiffusion between layers is avoided even at the high working temperature. The thickness of the individual layer was in the nanometer range. Coatings were characterized by means of SEM, TEM, GD-OES, SIMS, XRD and nanoindentation. A mechanism for the growth rate and diffusion of Ti and Si into the steel is discussed.",

keywords = "Chemical vapor deposition, FBR-CVD, Fluidized bed, Multilayer coating",

author = "J. Perez-Mariano and J. Caro and C. Colominas",

note = "Funding Information: The authors wish to thank the following companies and institutions for their collaboration: Institut Qu{\'i}mic de Sarri{\`a}, SRI International, Universitat de Barcelona (Prof. J. Esteve) and Tratamientos T{\'e}rmicos Carreras. JP gratefully acknowledges the financial support of DURSI (Generalitat de Catalunya) and European Social Fund. CC and JP would like to express their gratitude to Dr. A.Sanjurjo and Dr. K.H. Lau (SRI International) for their continuous support and helpful suggestions.; International Conference on Metallurgical Coatings and Thin Films, ICMCTF 2006 ; Conference date: 01-01-2006 Through 05-05-2006",

year = "2006",

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doi = "10.1016/j.surfcoat.2006.08.032",

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AU - Perez-Mariano, J.

AU - Caro, J.

AU - Colominas, C.

N1 - Funding Information: The authors wish to thank the following companies and institutions for their collaboration: Institut Químic de Sarrià, SRI International, Universitat de Barcelona (Prof. J. Esteve) and Tratamientos Térmicos Carreras. JP gratefully acknowledges the financial support of DURSI (Generalitat de Catalunya) and European Social Fund. CC and JP would like to express their gratitude to Dr. A.Sanjurjo and Dr. K.H. Lau (SRI International) for their continuous support and helpful suggestions.

PY - 2006/12/20

Y1 - 2006/12/20

N2 - TiN/SiNx multilayer coatings were deposited on stainless steel by Chemical Vapor Deposition in a Fluidized Bed Reactor at Atmospheric Pressure (AP/FBR-CVD) by reaction of TiCl4 and SiCl4 with NH3 at 850 °C. Due to the immiscibility of crystalline TiN and amorphous SiNx, interdiffusion between layers is avoided even at the high working temperature. The thickness of the individual layer was in the nanometer range. Coatings were characterized by means of SEM, TEM, GD-OES, SIMS, XRD and nanoindentation. A mechanism for the growth rate and diffusion of Ti and Si into the steel is discussed.

AB - TiN/SiNx multilayer coatings were deposited on stainless steel by Chemical Vapor Deposition in a Fluidized Bed Reactor at Atmospheric Pressure (AP/FBR-CVD) by reaction of TiCl4 and SiCl4 with NH3 at 850 °C. Due to the immiscibility of crystalline TiN and amorphous SiNx, interdiffusion between layers is avoided even at the high working temperature. The thickness of the individual layer was in the nanometer range. Coatings were characterized by means of SEM, TEM, GD-OES, SIMS, XRD and nanoindentation. A mechanism for the growth rate and diffusion of Ti and Si into the steel is discussed.

KW - Chemical vapor deposition

KW - FBR-CVD

KW - Fluidized bed

KW - Multilayer coating

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VL - 201

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JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - 7 SPEC. ISS.

T2 - International Conference on Metallurgical Coatings and Thin Films, ICMCTF 2006

Y2 - 1 January 2006 through 5 May 2006

ER -

TiN/SiN_x submicronic multilayer coatings obtained by chemical vapor deposition in a fluidized bed reactor at atmospheric pressure (AP/FBR-CVD)

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Keywords

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