Silicon nitride films by chemical vapor deposition in fluidized bed reactors at atmospheric pressure (AP/FBR-CVD)

J. Perez-Mariano, S. Borros, J. A. Picas, A. Forn, Carles Colominas*

*Autor corresponent d’aquest treball

Producció científica: Article en revista indexada › Article › Avaluat per experts

12 Cites (Scopus)

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Chemical Engineering