TY - JOUR
T1 - Silicon nitride films by chemical vapor deposition in fluidized bed reactors at atmospheric pressure (AP/FBR-CVD)
AU - Perez-Mariano, J.
AU - Borros, S.
AU - Picas, J. A.
AU - Forn, A.
AU - Colominas, Carles
N1 - Funding Information:
The authors wish to thank the following companies and institutions for their collaboration: Institut Químic de Sarrià, SRI International and Tratamientos Térmicos Carreras. JP gratefully aknowledges the financial support of DURSI (Generalitat de Catalunya) and European Social Fund. CC and JP would like to express their gratitude to Dr. A. Sanjurjo and Dr. K.H. Lau (SRI International) for their continuous support and helpful suggestions.
PY - 2005/11/21
Y1 - 2005/11/21
N2 - Silicon nitride thin films with thicknesses around 1 μm were deposited on AISI316 steel by Chemical Vapor Deposition in a Fluidized Bed Reactor at Atmospheric Pressure (AP/FBR-CVD). The films were obtained by reaction of SiCl4 and NH3 in a reducing atmosphere at temperatures in the range 725-775 °C. They were amorphous and substoichiometric. Activation of the bed particles through alternating reaction steps resulted in a higher deposition rate. The formation of chromium nitride was detected for several microns beneath the film. The deposition temperature was found to have a great influence in their morphology and mechanical properties. The coatings presented hardness values up to 26 GPa.
AB - Silicon nitride thin films with thicknesses around 1 μm were deposited on AISI316 steel by Chemical Vapor Deposition in a Fluidized Bed Reactor at Atmospheric Pressure (AP/FBR-CVD). The films were obtained by reaction of SiCl4 and NH3 in a reducing atmosphere at temperatures in the range 725-775 °C. They were amorphous and substoichiometric. Activation of the bed particles through alternating reaction steps resulted in a higher deposition rate. The formation of chromium nitride was detected for several microns beneath the film. The deposition temperature was found to have a great influence in their morphology and mechanical properties. The coatings presented hardness values up to 26 GPa.
KW - Chemical Vapor Deposition
KW - FBR-CVD
KW - Fluidized bed
KW - Silicon nitride
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U2 - 10.1016/j.surfcoat.2005.08.069
DO - 10.1016/j.surfcoat.2005.08.069
M3 - Article
AN - SCOPUS:28944444848
SN - 0257-8972
VL - 200
SP - 1719
EP - 1723
JO - Surface and Coatings Technology
JF - Surface and Coatings Technology
IS - 5-6
T2 - International Conference on Metallurgical Coatings and Thin Films, ICMCTF 2005
Y2 - 2 January 2005 through 6 January 2005
ER -