Thin films obtained by plasma polymerization of pyrrole were deposited on different substrates. The polymer films were obtained in a R.F. plasma polymerization reactor from low-pressure vapor of the pyrrole monomer. The R.F. power and gas pressure were adjusted to obtain optimal deposition rate and film adhesion to substrates. The film composition was determined using InftaRed Transmission and X-ray Photoelectron Spectroscopy (XPS).
|Revista||Journal De Physique. IV : JP|
|Estat de la publicació||Publicada - 1999|